I am a postdoctoral researcher in the Nanophotonics group, focusing on advanced metrology for logic semiconductor circuits through wavefront shaping, in collaboration with industrial partners. My research aims to develop highly precise nanoscale overlay (OVL) and alignment metrology techniques.

Previously, during my Ph.D., my work centered on computational imaging, ptychography, and physics-informed machine learning.

You can find more about my work on my personal website.