I am a postdoctoral researcher in the Nanophotonics group at Utrecht University, currently involved in advancing on-device metrology for semiconductor logic circuits through wavefront control, in collaboration with ASML. My research centers on developing high-precision overlay (OVL) and alignment metrology methods at the nanoscale.

Previously, as a Ph.D. candidate, my work focused on computational imaging, ptychography, and physics-informed machine learning.